Advanced dsRNA affinity purification and mass photometry characterization
Presenters:
Matt Ranaghan, Senior Scientist (Refeyn) and
Nathaniel Clark, Scientific Leader (Repligen)
Double-stranded RNA (dsRNA) impurities remain one of the most significant challenges in mRNA manufacturing. Difficult to accurately characterize and challenging to remove, these impurities can impact the quality, safety, and performance of mRNA therapeutics.
In this on-demand webinar, Matt Ranaghan (Refeyn) and Nathaniel Clark (Repligen) share the latest innovations in both dsRNA detection and removal, demonstrating how complementary technologies can help overcome critical bottlenecks in mRNA production.
What you’ll learn?
Discover how dMP enables:
- How a novel dsRNA-specific affinity resin delivers >100-fold reduction in impurities, down to ~0.00007% w/w – without compromising RNA integrity, and what this means for the performance of standard-nucleotide mRNA
- How mass photometry can detect and profile trace dsRNA impurities by leveraging surface repulsion to exclude the bulk analyte and extend traditional concentration limits
- How these complementary approaches provide a powerful, scalable toolkit to improve the safety and performance of mRNA therapeutics